prof. Claudio Verona
Objective: The main aim of the course is to discuss the most relevant material deposition process and microfabrication techniques for the realization of micro devices. The course consists of both lectures and laboratory sessions.
Program: Thin film growth techniques: physical vapor deposition (PVD), molecular beam epitaxy (MBE), and chemical vapor deposition (CVD). Doping methods. Metal and oxide deposition (Electron gun evaporation, thermal evaporation and Sputter techniques). Lithography techniques (optical and electron beam lithography). Mask design (AutoCAD for mask drawing). Material etching process (dry etching, wet etching, reactive ion etching). Solid state electronic devices.